Structure and thermal properties of thin film poly(α-methylstyrene) deposited via plasma-enhanced CVD

被引：15

作者：

Burkey, DD ^{[1
]}

Gleason, KK ^{[1
]}

机构：

[1] MIT, Dept Chem Engn, Cambridge, MA 02139 USA

来源：

CHEMICAL VAPOR DEPOSITION | 2003年 / 9卷 / 02期

关键词：

alpha-methylstyrene; plasma polymer; thermal stability;

D O I：

10.1002/cvde.200390004

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Plasma-enhanced (PE) CVD from a-methylstyrene is a dry method for synthesizing directly patternable sacrificial materials for generating pores or air dielectric layers. Films deposited at low power excitation (40 W) decompose between 65 degreesC and 75 degreesC, leave minimal residue following a 400 degreesC anneal for 2 h, and have spectroscopic signatures of linear poly(alpha-methylstyrene) (PaMS) as determined by nuclear magnetic resonance (NMR) spectroscopy and Fourier transform infrared (FTIR) spectroscopy. Increased plasma excitation power leads to cross-linking and increased residue after annealing. All films also contain hydroxyl and carbonyl groups after exposure to air. Significant C-O-C inclusion occurs under continuous plasma excitation but not under pulsed-plasma conditions.

引用

页码：65 / 71

页数：7

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