Resonant states induced by shallow acceptors in uniaxially strained semiconductors

被引:26
作者
Odnoblyudov, MA
Yassievich, IN
Chistyakov, VM
Chao, KA
机构
[1] Lund Univ, Dept Theoret Phys, S-22362 Lund, Sweden
[2] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
[3] State Tech Univ, St Petersburg, Russia
关键词
D O I
10.1103/PhysRevB.62.2486
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a detailed theoretical investigation of resonant states induced by shallow accepters in uniaxially strained semiconductors. By applying Dirac's approach and using the Coulomb potential of an acceptor impurity, we have obtained the amplitude of resonant scattering, the probability of coherent capture and emission of holes by resonant state, and the characteristic features of the resonant state. The modified dispersion law and density-of-states of valence band by the resonant states have also been derived. The energy dependence of optical transition probability between resonant and localized impurity state have been calculated. The theoretical investigation of a new mechanism for carrier population inversion in strained semiconductors under an electric field has been presented. It has been shown that the mechanism is the result of a coherent capture emission type inelastic scattering of holes by resonant states. The calculation based on our theory for uniaxially strained p-Ge explains the recently observed lasing phenomena in THz frequency region.
引用
收藏
页码:2486 / 2495
页数:10
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