Diffractive elements with novel antireflection film stacks

被引：2

作者：

Elfström, H

Vallius, T

Kuittinen, M

Turunen, J

Clausnitzer, T

Kley, EB

机构：

[1] Univ Joensuu, Dept Phys, FI-80101 Joensuu, Finland

[2] Univ Jena, Inst Appl Phys, D-07743 Jena, Germany

来源：

OPTICS EXPRESS | 2004年 / 12卷 / 25期

关键词：

D O I：

10.1364/OPEX.12.006385

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Antireflection coatings fabricated between the substrate and the diffractive microstructure are shown to reduce Fresnel losses effectively, especially for high-index substrates used in the infrared region, if the diffractive structure and the antireflection stack are designed simultaneously. A substantial reduction of the Fabry-Perot effect caused by the high-index substrate is observed by using antireflection layers with films thicker than the normal quarter-wave films. (C) 2004 Optical Society of America.

引用

页码：6385 / 6390

页数：6

共 8 条

[1]

Dammann H., 1971, Optics Communications, V3, P312, DOI 10.1016/0030-4018(71)90095-2

[2] Use of Fourier series in the analysis of discontinuous periodic structures [J].

Li, LF .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1996, 13 (09) :1870-1876

[3] Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings [J].

Li, LF .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1996, 13 (05) :1024-1035

[4]

Macleod H. A., 1986, THIN FILM OPTICAL FI

[5]

MOLL M, SILICON WAFER PRODUC

[6]

Taghizadeh M. R., 1992, Optical Computing & Processing, V2, P221

[7] Diffractive optics: Electromagnetic approach [J].

Turunen, J ;

Kuittinen, M ;

Wyrowski, F .

PROGRESS IN OPTICS, VOL XL, 2000, 40 :343-388

[8]

TURUNEN J, 1997, DIFFRACTIVE OPTICS I

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