ZnO film growth on (01(1)over-bar2)LiTaO3 by electron cyclotron resonance-assisted molecular beam epitaxy and determination of its polarity

被引:53
作者
Nakamura, K [1 ]
Shoji, T [1 ]
Kang, HB [1 ]
机构
[1] Tohoku Univ, Grad Sch Engn, Dept Elect & Commun Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2000年 / 39卷 / 6A期
关键词
ZnO; LiTaO3; epitaxy; polarity; MBE; ECR; SAW; piezoelectrics;
D O I
10.1143/JJAP.39.L534
中图分类号
O59 [应用物理学];
学科分类号
摘要
Single-crystal ZnO films were grown on (01 (1) over bar 2)LiTaO3 substrates by electron cyclotron resonance-assisted molecular beam epitaxy (ECR-assisted MBE). The film orientation differed with the ratio of oxygen to zinc. Under oxygen-rich conditions, (11 (2) over bar 0)ZnO films with the c-axis parallel to the substrate surface were epitaxially grown. To identify the polarity of ZnO films with the c-axis parallel to the surface, a method using sideways chemical etching was proposed. The polarity of ZnO films was different when the films were grown on the + plane or the - plane of (01 (1) over bar 2)LiTaO3 substrates. The ZnO/LiTaO3 substrates offer a high electromechanical coupling factor of the shear horizontal-type leaky surface acoustic wave (SH-type leaky SAW) propagating along the X-axis due to an additional contribution of the piezoelectric shear effect of ZnO.
引用
收藏
页码:L534 / L536
页数:3
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