Hexagonal nanostructures generated by light masks for neutral atoms

被引：104

作者：

Drodofsky, U ^{[1
]}

Stuhler, J ^{[1
]}

Schulze, T ^{[1
]}

Drewsen, M ^{[1
]}

Brezger, B ^{[1
]}

Pfau, T ^{[1
]}

Mlynek, J ^{[1
]}

机构：

[1] Univ Konstanz, Fak Phys, D-78457 Constance, Germany

来源：

APPLIED PHYSICS B-LASERS AND OPTICS | 1997年 / 65卷 / 06期

关键词：

D O I：

10.1007/s003400050342

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A beam of neutral atoms is focused by a light mask to write nanometer-scale structures on a surface. The force exerted on the induced dipole moment of an atom in a standing-wave light field is used to manipulate the trajectories of the atoms before they are deposited. We report on experiments generating various two-dimensional patterns with this atom lithography technique. The interference of three coplanar laser beams, separated by 120 degrees from each other, is used to write chromium patterns of hexagonal symmetry with a lattice constant of a = (2/3)lambda = 283.7 nm on a silicon substrate. Depending on the relative intensity of the three laser beams and the laser frequency with respect and to a dipole resonance transition Cr-52, different patterns can be generated. Possible applications using the inherent properties of atom lithography, e.g. the fabrication of photonic bandgap material, are discussed.

引用

页码：755 / 759

页数：5

共 14 条

[1] ATOM OPTICS [J].