High-speed focused-ion-beam patterning for guiding the growth of anodic alumina nanochannel arrays

被引:78
作者
Liu, NW
Datta, A
Liu, CY
Wang, YL
机构
[1] Acad Sinica, Inst Atom & Mol Sci, Taipei 106, Taiwan
[2] Natl Taiwan Univ, Dept Phys, Taipei 106, Taiwan
关键词
D O I
10.1063/1.1555689
中图分类号
O59 [应用物理学];
学科分类号
摘要
Long-range ordered arrays of anodic alumina nanochannels are grown by anodizing an aluminum covered with a patterned layer of polymethylmethacrylate (PMMA) resist. The two-dimensional hexagonal-closed-packed pattern is created by focused ion beam (FIB) exposure of the PMMA and transferred onto the aluminum surface by phosphoric acid etching. The required exposure time per channel is only similar to20 mus, more than two orders of magnitude reduction in comparison with the previous method employing FIB direct sputtering of the aluminum surface. (C) 2003 American Institute of Physics.
引用
收藏
页码:1281 / 1283
页数:3
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