Temperature-dependent internal friction in silicon nanoelectromechanical systems

被引:98
作者
Evoy, S [1 ]
Olkhovets, A
Sekaric, L
Parpia, JM
Craighead, HG
Carr, DW
机构
[1] Virginia Polytech Inst & State Univ, Bradley Dept Elect & Comp Engn, Blacksburg, VA 24061 USA
[2] Cornell Univ, Cornell Ctr Mat Res, Ithaca, NY 14853 USA
[3] Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA
关键词
D O I
10.1063/1.1316071
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the temperature-dependent mechanical properties of nanofabricated silicon resonators operating in the megahertz range. Reduction of temperature leads to an increase of the resonant frequencies of up to 6.5%. Quality factors as high as 1000 and 2500 are observed at room temperature in metallized and nonmetallized devices, respectively. Although device metallization increases the overall level of dissipation, internal friction peaks are observed in all devices in the T=160-180 K range. (C) 2000 American Institute of Physics. [S0003-6951(00)01541-2].
引用
收藏
页码:2397 / 2399
页数:3
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