Morphology of silver thin films deposited on TiO2(110) surfaces

被引：18

作者：

Abriou, D ^{[1
]}

Gagnot, D ^{[1
]}

Jupille, J ^{[1
]}

Creuzet, F ^{[1
]}

机构：

[1] CNRS, Lab St Gobain Surface Verre & Interfaces, F-93303 Aubervilliers, France

来源：

SURFACE REVIEW AND LETTERS | 1998年 / 5卷 / 01期

关键词：

D O I：

10.1142/S0218625X98000712

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The growth mode of silver films deposited at room temperature on TiO2(110) surfaces has been examined by means of atomic force microscopy (;LFM) and X-ray photoelectron spectroscopy (XPS) in ultrahigh vacuum (UHV) conditions. On clean vacancy-free TiO2(110) surfaces, 0.1-nm-thick (on average) Ag deposits form a two-dimensional (2D) layer. When the thickness of the silver overlayer is increased, 3D clusters are shown to appear while the 2D film is preserved. Furthermore, the influence of surface oxygen vacancies on the growth of Ag/TiO2(110) is evidenced by well-characterized differences in the morphology of S-nm-thick silver deposits.

引用

页码：387 / 392

页数：6

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