Ultralow-temperature kinetics of CH(X(2)Pi) reactions: Rate coefficients for reactions with O-2 and NO (T=13-708 K), and with NH3 (T=23-295 K)

被引:76
作者
Bocherel, P
Herbert, LB
Rowe, BR
Sims, IR
Smith, IWM
Travers, D
机构
[1] UNIV RENNES 1,DEPT PHYS ATOM & MOL,CNRS,URA 1203,F-35042 RENNES,FRANCE
[2] UNIV BIRMINGHAM,SCH CHEM,BIRMINGHAM B15 2TT,W MIDLANDS,ENGLAND
关键词
D O I
10.1021/jp952628f
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The pulsed laser photolysis (PLP), laser-induced fluorescence (LIF) technique for the study of the kinetics of free-radical reactions is applied to reactions of CH radicals both in the ultralow-temperature environment of a Cinetique de Reaction en Ecoulement Supersonique Uniforme (CRESU) apparatus, as well as in a conventional heated cell. The combined techniques provide kinetic data over an extremely wide temperature range. Rate coefficients are reported for the reactions of CH with O-2 (T = 13-708 K), NO (T = 13-708 K), and NH3 (T = 23-295 K). All three reactions remain very rapid down to the lowest temperatures at which measurements were made and display differing temperature dependences. The results are discussed in the light of previous work on these systems and of the reaction mechanisms.
引用
收藏
页码:3063 / 3069
页数:7
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