Spatially resolved measurements of HTS microwave surface impedance

被引:9
作者
Gallop, J
Hao, L
Abbas, F
机构
[1] Centre for Quantum Metrology, National Physical Laboratory, Teddington
来源
PHYSICA C | 1997年 / 282卷
关键词
D O I
10.1016/S0921-4534(97)00926-X
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a novel technique for the characterisation of microwave properties of HTS films which allows the spatial variation of this important physical parameter to be measured. The method employs a dielectric puck system which can be moved over the surface of a large wafer, sampling the surface impedance at a number of discrete frequencies between 5 and 15 GHz. The surface impedance can also be rapidly measured as a function of microwave magnetic field strength. Spatial resolution in this case is as small as 3 mm.
引用
收藏
页码:1579 / 1580
页数:2
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