Theoretical discussion of diffusion effects in negative chemically amplified resists based on contrast curve simulation

被引:4
作者
Patsis, GP [1 ]
Meneghini, G
Glezos, N
Argitis, P
机构
[1] NCSR Demokritos, Inst Microelect, Athens 15310, Greece
[2] CSELT SpA, I-10148 Turin, Italy
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1997年 / 15卷 / 06期
关键词
D O I
10.1116/1.589685
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Gel formation theory is discussed in the case of chemically amplified resists (CARs) and a specific epoxy-based resist is used in order to model the results. It is found that existing gel formation models may be classified in four classes and there are two important parameters (inhibitor activity and maximum number of available crosslinkable sites) which must be specially interpreted in order to account for chemical amplification and diffusion mechanisms in CARs. It is also proved that a Charlesby-Pinner representation of the gel-dose relationship reveals qualitative characteristics of the process and composition changes. (C) 1997 American Vacuum Society.
引用
收藏
页码:2561 / 2564
页数:4
相关论文
共 15 条
[1]   Advanced epoxy novolac resist for fast high-resolution electron-beam lithography [J].
Argitis, P ;
Raptis, I ;
Aidinis, CJ ;
Glezos, N ;
Baciocchi, M ;
Everett, J ;
Hatzakis, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06) :3030-3034
[2]   GEL FORMATION IN NEGATIVE ELECTRON RESISTS [J].
ATODA, N ;
KAWAKATSU, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (10) :1519-1524
[3]  
Bovey F.A., 1958, EFFECTS IONIZING RAD
[4]   GEL FORMATION AND MOLECULAR WEIGHT DISTRIBUTION IN LONG-CHAIN POLYMERS [J].
CHARLESBY, A .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1954, 222 (1151) :542-557
[5]   A THEORY OF NETWORK FORMATION IN IRRADIATED POLYESTERS [J].
CHARLESBY, A .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1957, 241 (1227) :495-507
[6]  
FLORY PJ, 1941, J AM CHEM SOC, V63, P3097
[7]   Application of a reaction-diffusion model for negative chemically amplified resists to determine electron-beam proximity correction parameters [J].
Glezos, N ;
Patsis, GP ;
Raptis, I ;
Argitis, P ;
Gentili, M ;
Grella, L .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4252-4256
[8]   FUNDAMENTAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY .1. DEPTH-DOSE RESPONSE OF POLYMERIC ELECTRON-BEAM RESISTS [J].
HEIDENREICH, RD ;
THOMPSON, LF ;
FEIT, ED ;
MELLIARS.CM .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (09) :4039-4047
[10]   A SYNOPSIS OF EMPIRICAL GEL FRACTION ANALYTICAL METHODS - APPLICATION OF THE WANXI EQUATION TO POLYETHYLENES IRRADIATED IN VACUO AND IN THE PRESENCE OF ACETYLENE [J].
JONES, RA .
JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS, 1994, 32 (12) :2049-2053