Probing the near fields of the super-resolution near-field optical structure

被引：121

作者：

Tsai, DP ^{[1
]}

Lin, WC ^{[1
]}

机构：

[1] Natl Taiwan Univ, Dept Phys, Taipei 10617, Taiwan

来源：

APPLIED PHYSICS LETTERS | 2000年 / 77卷 / 10期

关键词：

D O I：

10.1063/1.1290692

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Super-resolution near-field structure, glass/SiN (170 nm)/Sb (15 nm)/SiN (20 nm), a promising structure for near-field ultrahigh-density optical data storage, has been studied by a tapping-mode tuning-fork near-field scanning optical microscope in transmission mode. Both propagating and evanescent field intensities were found at the focused spots of the surface of the super-resolution near-field structure. Images of the near-field intensity gradients at different excited laser powers (0.42-2.43 mu W) showed that the area of the static evanescent intensity could be stably controlled. The enhancement of the near-field intensity, and the reduction of the focused spot through the super-resolution near-field structure, glass/SiN (170 nm)/Sb (15 nm)/SiN (20 nm) have been observed. (C) 2000 American Institute of Physics. [S0003-6951(00)01236-5].

引用

页码：1413 / 1415

页数：3

共 18 条

[1]

AGRANOVICH VM, 1982, SURFACE POLARITONS, P331

[2] NEAR-FIELD OPTICS - MICROSCOPY, SPECTROSCOPY, AND SURFACE MODIFICATION BEYOND THE DIFFRACTION LIMIT [J].