1.48 μm emission properties and the cross-relaxation mechanism in chalcohalide glass doped with Tm3+

被引:21
作者
Han, YS [1 ]
Lee, DJ [1 ]
Heo, J [1 ]
机构
[1] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Photon Glasses Lab, Nam Gu, Pohang 790784, Gyeongbuk, South Korea
关键词
D O I
10.1016/S0022-3093(03)00234-5
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
1.48 mum emission properties and the cross-relaxation mechanism of Tm3+ ions in 0.7(Ge0.25As0.10S0.65) + 0.15GaS(3/2) + 0.15CsBr glass were investigated. Both the relative intensity ratio of the 1.48 pin emission to 1.82 mum and the measured lifetime of the H-3(4) level decreased with increasing Tm3+ concentration. When temperature decreased from room temperature to 20 K, lifetimes of the H-3(4) level increased from 670 to 970 mus. At the same time, the critical distance for cross-relaxation decreased from 1.11 to 0.93 nm. These results indicate that cross-relaxation (H-3(4), H-3(6) --> F-3(4), F-3(4)) became less effective as temperature decreased. Analysis of the temperature dependence of cross-relaxation rates showed that cross-relaxation in Tm3+ is a phonon-assisted energy transfer process. The major phonon contributing to the process is from the Ga-Br vibration in [GaS3/2Br](-) units. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:210 / 216
页数:7
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