Damping of oscillations in layer-by-layer growth

被引：19

作者：

Kallabis, H

Brendel, L

Krug, J

Wolf, DE

机构：

[1] Forschungszentrum Julich, HLRZ, D-52425 Julich, Germany

[2] Gerhard Mercator Univ, D-47048 Duisburg, Germany

[3] Univ Essen Gesamthsch, Fachbereich Phys, D-45117 Essen, Germany

来源：

INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 1997年 / 11卷 / 31期

关键词：

D O I：

10.1142/S0217979297001829

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present a theory for the damping of layer-by-layer growth oscillations in molecular beam epitaxy. The surface becomes rough on distances larger than a layer coherence length which is substantially larger than the diffusion length. The damping time can be calculated by a comparison of the competing roughening and smoothening mechanisms. The dependence on the growth conditions, temperature and deposition rate, is characterized to be a power law. The theoretical results are confirmed by computer simulations.

引用

页码：3621 / 3634

页数：14

共 36 条

[1] UNIVERSALITY IN SURFACE GROWTH - SCALING FUNCTIONS AND AMPLITUDE RATIOS [J].