Behavior of URu2Si2 in an applied magnetic field

被引：54

作者：

Santini, P ^{[1
]}

机构：

[1] Univ Lausanne, Inst Theoret Phys, CH-1015 Lausanne, Switzerland

来源：

PHYSICAL REVIEW B | 1998年 / 57卷 / 09期

关键词：

D O I：

10.1103/PhysRevB.57.5191

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Electrical resistivity, thermal expansion, and magnetization of URu2Si2 in an applied magnetic field are analyzed within a model based on quadrupolar ordering of U ions with localized f electrons. This model, which had been shown to be consistent with macroscopic properties in a field tending to zero, can be used to account for the observed behavior in a finite field.

引用

页码：5191 / 5199

页数：9

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