Depth-sensing indentation response of ordered silica foam

被引：39

作者：

Toivola Y. ^{[1
]}

Stein A. ^{[2
]}

Cook R.F. ^{[1
]}

机构：

[1] Dept. of Chem. Eng./Materials Sci., University of Minnesota, Minneapolis

[2] Department of Chemistry, University of Minnesota, Minneapolis

来源：

Journal of Materials Research | 2004年 / 19卷 / 1期

关键词：

D O I：

10.1557/jmr.2004.19.1.260

中图分类号：

学科分类号：

摘要：

Depth-sensing indentation was applied to three-dimensionally ordered silica foams of two different pore diameters - 500 nm and 850 nm - formed by colloidal crystal templating. The contact responses of indentations with Berkovich and hemispherical indentation tips are presented over a load range of 1 mN to 100 mN. Scanning electron microscopy images of residual indentation impressions showed homogeneous deformation for small loads in which the peak displacement was shallow relative to the film-substrate interface. The characteristics of the load-displacement responses changed from periodic discontinuities, associated with cell wall fracture and pore collapse, to smooth and increased stiffness, as a result of densification due to the accumulation of material under the indentation tip and proximity (and contact) of the substrate. Load-displacement responses were translated into pressure-volume space, in which the average pressure during indentation is a measure of the crushing pressure of the cell walls. © 2004 Materials Research Society.

引用

页码：260 / 271

页数：11

共 30 条

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