Electrodeposition of Co + Ni alloys on modified silicon substrates

被引:44
作者
E. Gómez
E. Vallés
机构
[1] Universitat de Barcelona,Laboratori de Ciència i Tecnologia Electroquímica de Materials, Departament de Química física
关键词
alloys; anomalous deposition; cobalt; electrodeposition; nickel; silicon;
D O I
10.1023/A:1003580302490
中图分类号
学科分类号
摘要
Cobalt+nickel alloys were electrodeposited on different base-silicon substrates since these alloys are interesting for several magnetic device applications. Acid chloride baths were used to obtain magnetic cobalt+nickel layers directly over silicon surfaces, tantalum silicide or metallic seed-layers. Although the initial stages of nucleation were influenced by the kind of substrate, in all substrates nucleation and three-dimensional growth evolving to compact, fine-grained and homogeneous deposition, took place. Preferential deposition of cobalt and anomalous codeposition occurred. Different compositions of the alloy were obtained, as is normal with a solid–solution formation. The cobalt content in the deposit rose with increase in both cobalt(ii) and saccharin concentrations and fell with decrease in the applied potential or current density.
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页码:803 / 810
页数:7
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