Kinetics of formation of an oxide film on the surface of the cathode in an atmospheric-pressure glow discharge in helium

被引：1

作者：

Arkhipenko V.I. ^{[1
]}

Greben' V.Z. ^{[2
]}

Dlugunovich V.A. ^{[2
]}

Zgirovskii S.M. ^{[1
]}

Simonchik L.V. ^{[1
]}

机构：

[1] Inst. of Molec. and Atomic Physics, Natl. Academy of Sciences of Belarus, 70 F. Skorina Ave., M.

[2] B. I. Stepanov Institute of Physics, Natl. Academy of Sciences of Belarus, Minsk, Belarus

来源：

Journal of Applied Spectroscopy | 2004年 / 71卷 / 3期

关键词：

atmospheric-pressure glow discharge; directional hemispherical coefficient of reflection; laser reflectometry; oxide film;

D O I：

10.1023/B:JAPS.0000039970.66878.98

中图分类号：

学科分类号：

摘要：

The kinetics of formation of an oxide film on the surface of the cathode of an atmospheric-pressure glow discharge in helium has been investigated by the method of laser reflectometry. It has been established that the film is formed at a cathode temperature exceeding 550 K, and in 200 sec from the time of discharge initiation at a current of 1 A it becomes thicker than 1 μm. The film consists of several concentric zones. For each of these zones, a change in time of the directional hemispherical coefficient of reflection at a wavelength of 0.63 μm was determined. It is shown that the formation of an oxide film on the cathode surface leads to an increase in the cathode drop.

引用

页码：410 / 416

页数：6

共 9 条

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