High-Temperature Stress Measurements During the Oxidation of NiAl

被引:1
作者
E. Schumann
C. Sarioglu
J. R. Blachere
F. S. Pettit
G. H. Meier
机构
[1] University of Pittsburgh,Department of Materials Science and Engineering
来源
Oxidation of Metals | 2000年 / 53卷
关键词
NiAl; alumina; growth stress; X-ray diffraction;
D O I
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中图分类号
学科分类号
摘要
The growth stresses in α-alumina scales growing on stoichiometric NiAlduring oxidation in air at 1100°C have been measured by two X-raydiffraction techniques: the classic rocking technique and a newly developedfixed-incidence multiplane (FIM) technique. The growth stresses were foundto be within the experimental uncertainty of the measurements, i.e., nearzero. Measurement of the residual stresses using an optical-fluorescencespectroscopy (OFS) technique in adherent regions of the scale, after coolingto room temperature, were consistent with the growth stresses having beennegligibly small. These measurements contrast with previous measurements ofgrowth stresses in α-alumina growing on Fe–Cr–Al alloys,using the FIM technique, which indicated compressive growth stresses on theorder of 1 GPa. Possible reasons for these differences are discussed.
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页码:259 / 272
页数:13
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