STUDY OF XPS PHOTOEMISSION OF SOME GADOLINIUM COMPOUNDS

被引:163
作者
RAISER, D
DEVILLE, JP
机构
[1] Groupe Surfaces-Interfaces, UM 380046 - IPCMS, 67070 Strasbourg Cedex
关键词
D O I
10.1016/0368-2048(91)85016-M
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
XPS photoemission lines from GdF3, GdCl3, Gd2 (SO4)3, Gd(NO3)3, Gd2O3 and metallic Gd have been measured in order to determine their chemical shifts. The atomic sensitivity factors of Gd3d and Gd4d transitions have been determined along with Auger parameters wherever possible.
引用
收藏
页码:91 / 97
页数:7
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