CONTROL OF MECHANICAL AND STRUCTURAL-PROPERTIES OF COATINGS DEPOSITED USING UNBALANCED MAGNETRONS

被引：14

作者：

ARNELL, RD

机构：

[1] Department of Aeronautical and Mechanical Engineering, University of Salford, Salford

来源：

SURFACE & COATINGS TECHNOLOGY | 1993年 / 59卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(93)90063-T

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

This paper briefly describes the principles of operation of unbalanced magnetron sputtering systems and indicates how film structure and properties can be controlled by controlling the deposition parameters. Two examples are described: firstly control of the structure, grain size and preferred orientation of fully dense copper films; secondly, control of the hardness, critical load and wear resistance of titanium nitride films. In both cases, it is shown that unbalanced magnetrons can be used to manufacture coatings of exceptionally high quality.

引用

页码：105 / 109

页数：5