AMPEROMETRIC RESPONSE OF MICROLITHOGRAPHICALLY FABRICATED MICROELECTRODE ARRAY FLOW SENSORS IN A THIN-LAYER CHANNEL

Microelectrode arrays were fabricated by use of photolithographic techniques. The electrodes consisted of gold metal deposited on a silicon substrate, pretreated by thermal oxidation to form a thin surface layer of silicon dioxide. These electrodes were tested in a rectangular flow cell under laminar flow conditions. The experimental steady-state response of these electrodes was evaluated by using flow injection methodology and compared with theoretical behavior predicted by backward implicit finite difference simulations. Currents and their dependence on flow rate show good agreement with theory.