PHOTOELECTRON DIFFRACTION FROM TE ON NI(100) AND CU(100)

被引：11

作者：

JOHNSON, PD

WOODRUFF, DP

FARRELL, HH

SMITH, NV

TRAUM, MM

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

[2] UNIV WARWICK,DEPT PHYS,COVENTRY CV4 7AL,W MIDLANDS,ENGLAND

来源：

SURFACE SCIENCE | 1983年 / 129卷 / 2-3期

关键词：

D O I：

10.1016/0039-6028(83)90187-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：366 / 374

页数：9

共 14 条

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[6] PHOTOELECTRON DIFFRACTION STUDY OF I-CHEMISORBED ON AG(111) [J].

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[7] STRUCTURAL SENSITIVITY OF PHOTOELECTRON DIFFRACTION AZIMUTHAL PATTERNS [J].

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[8] NORMAL PHOTOELECTRON DIFFRACTION OF SE 3D LEVEL IN SE OVERLAYERS ON NI(100) [J].

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[9] STRUCTURAL DETERMINATION OF MOLECULAR OVERLAYER SYSTEMS WITH NORMAL PHOTOELECTRON DIFFRACTION - C(2X2) CO-NI(001) AND (SQUARE-ROOT-3 X SQUARE-ROOT-3) R30-DEGREES CO-NI(111) [J].

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[10] DETERMINATION OF STRUCTURE OF ORDERED ADSORBED LAYERS BY ANALYSIS OF LEED SPECTRA [J].

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