ARF (193 NM) LASER PHOTOLYSIS OF HN3, CH3NH2, AND N2H4 - FORMATION OF EXCITED NH RADICALS

被引：39

作者：

HAAK, HK ^{[1
]}

STUHL, F ^{[1
]}

机构：

[1] RUHR UNIV BOCHUM,D-4630 BOCHUM,FED REP GER

来源：

JOURNAL OF PHYSICAL CHEMISTRY | 1984年 / 88卷 / 16期

关键词：

D O I：

10.1021/j150660a050

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：3627 / 3633

页数：7

共 24 条

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