PROCEDURE FOR ELECTRON AND ION LENS OPTIMIZATION

被引：14

作者：

SZILAGYI, M ^{[1
]}

YAKOWITZ, SJ ^{[1
]}

DUFF, MO ^{[1
]}

机构：

[1] UNIV ARIZONA,DEPT SYST & IND ENGN,TUCSON,AZ 85721

来源：

关键词：

D O I：

10.1063/1.94559

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：7 / 9

页数：3

共 12 条

[1]

Fletcher R., 1981, PRACTICAL METHODS OP, V2

[2]

FLETCHER R, 1972, AERE R7125 REP

[3] ELECTRON LENSES [J].

MULVEY, T ;

WALLINGTON, MJ .

[4]

SEPTIER A, 1980, ADV ELECTRONICS SA, V13

[5]

SEPTIER A, 1967, FOCUSING CHARGED PAR, V1

[6]

Szidarovszky F., 1978, PRINCIPLES PROCEDURE

[7] IMPROVEMENT OF ELECTROSTATIC LENSES FOR ION-BEAM LITHOGRAPHY [J].

SZILAGYI, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1137-1140

[8]

SZILAGYI M, 1977, OPTIK, V48, P215

[9]

SZILAGYI M, 1978, OPTIK, V50, P35

[10]

SZILAGYI M, 1977, OPTIK, V49, P223