THERMAL-CONDUCTIVITY OF HEAVILY DOPED LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED POLYCRYSTALLINE SILICON FILMS

被引：107

作者：

TAI, YC ^{[1
]}

MASTRANGELO, CH ^{[1
]}

MULLER, RS ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,ELECT RES LAB,BERKELEY,CA 94720

来源：

关键词：

D O I：

10.1063/1.339924

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1442 / 1447

页数：6

共 7 条

[1] THERMAL AND ELECTRICAL ANISOTROPY OF POLYCRYSTALLINE SILICON
BEAN, KE
HENTZSCHEL, HP
COLMAN, D
[J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (05) : 2358 - +
[2] DUSHMAN S, 1962, SCI F VACUUM TECHNIQ
[3] HOWE RT, 1982, SPR EL SOC M MONTR, V82, P184
[4] JACOB M, 1963, HEAT TRANSFER
[5] Tai Y. C., 1985, TRANSDUCERS '85. 1985 International Conference on Solid-State Sensors and Actuators. Digest of Technical Papers (Cat. No.85CH2127-9), P354
[6] TAI YC, 1987, 4TH INT C SOL STAT S, P360
[7] Toulokian Y. S., 1970, THERMAL CONDUCTIVITY