INFLUENCE OF HCLO4 STRENGTH AND ETCHING TIME ON RATE OF ETCHING AND SURFACE-ROUGHNESS OF HUMAN-ENAMEL

被引：10

作者：

DIJKMAN, AG ^{[1
]}

TAK, J ^{[1
]}

JONGEBLOED, WL ^{[1
]}

ARENDS, J ^{[1
]}

机构：

[1] UNIV GRONINGEN,CTR ELECTRON MICROSCOPY,9713 AV GRONINGEN,NETHERLANDS

来源：

CARIES RESEARCH | 1983年 / 17卷 / 01期

关键词：

D O I：

10.1159/000260644

中图分类号：

R78 [口腔科学];

学科分类号：

1003 ;

摘要：

引用

页码：14 / 22

页数：9

共 20 条

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