PLASMA-ETCHING OF SIALON

被引:8
作者
CHATFIELD, C [1 ]
NORSTROM, H [1 ]
机构
[1] INST MICROWAVE TECHNOL,S-10044 STOCKHOLM,SWEDEN
关键词
D O I
10.1111/j.1151-2916.1983.tb10630.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:C168 / C168
页数:1
相关论文
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