SURFACE COMPOSITION AND CHEMISTRY OF EVAPORATED PERMALLOY-FILMS OBSERVED BY X-RAY PHOTOEMISSION SPECTROSCOPY AND BY AUGER-ELECTRON SPECTROSCOPY

被引:35
作者
POLLAK, RA [1 ]
BAJOREK, CH [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1063/1.321736
中图分类号
O59 [应用物理学];
学科分类号
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页码:1382 / 1388
页数:7
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