QUANTITATIVE-ANALYSIS OF RESOLUTION AND STABILITY IN NANOMETER ELECTRON-BEAM LITHOGRAPHY

被引:31
作者
KRATSCHMER, E
RISHTON, SA
KERN, DP
CHANG, THP
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期
关键词
D O I
10.1116/1.584115
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:2074 / 2079
页数:6
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[4]   MEASUREMENT OF THE PROFILE OF FINELY FOCUSED ELECTRON-BEAMS IN A SCANNING ELECTRON-MICROSCOPE [J].
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[5]  
ZWORYKIN VK, 1945, ELECTRON OPTICS ELEC