POSSIBLE EVIDENCE OF QUANTUM-SIZE EFFECTS IN X-RAY PHOTOEMISSION SPECTRA OF ULTRATHIN SI LAYERS

被引：21

作者：

DIBIASE, N

GABETTA, G

LUMACHI, A

SCAGLIOTTI, M

PARMIGIANI, F

机构：

[1] CISE SPA,DIV MAT & TECNOL,MILAN,ITALY

[2] POLITECN MILAN,DIPARTIMENTO FIS,I-20133 MILAN,ITALY

来源：

APPLIED PHYSICS LETTERS | 1995年 / 67卷 / 17期

关键词：

D O I：

10.1063/1.114618

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This letter reports the experimental evidence of a 2.3 eV blue shift of the plasmon loss lines observed in the x-ray photoelectron spectra of an ultrathin Si layer equivalent to 1.5 X 10(15) at./cm(2) deposited onto a randomly oriented Al2O3 Single crystal. The plasmon line shifts, which is roughly proportional to the deposited Si(mass)(-2/3), are attributed to quantum confinement effects in agreement with electron energy loss measurements performed on nanosized Si particles. (C) 1995 American Insitute of Physics.

引用

页码：2491 / 2493

页数：3

共 11 条

[1]

BAGLIN JEE, 1989, HDB ION BEAM PROCESS, pCH14

[2] SILICON QUANTUM WIRE ARRAY FABRICATION BY ELECTROCHEMICAL AND CHEMICAL DISSOLUTION OF WAFERS [J].