HELIUM CONTINUUM LIGHT SOURCE FOR PHOTOELECTRIC SCANNING IN THE 600-1100A REGION

被引：71

作者：

HUFFMAN, RE

TANAKA, Y

LARRABEE, JC

机构：

来源：

APPLIED OPTICS | 1963年 / 2卷 / 06期

关键词：

D O I：

10.1364/AO.2.000617

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：617 / 623

页数：7

共 24 条

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