TIN (4) CHLORIDE SOLUTION AS A SENSITIZER IN PHOTO-SELECTIVE METAL DEPOSITION

被引：38

作者：

BAYLIS, BKW ^{[1
]}

BUSUTTIL, A ^{[1
]}

HEDGECOCK, NE ^{[1
]}

SCHLESINGER, M ^{[1
]}

机构：

[1] UNIV WINDSOR,DEPT PHYS,WINDSOR N9B 3P4,ONTARIO,CANADA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 03期

关键词：

D O I：

10.1149/1.2132823

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：348 / 351

页数：4

共 18 条

[1]

BAILAR JC, 1956, CHEMISTRY COORDINATI, P446

[2]

BERNHARDT G, 1971, Patent No. 3616296

[3] ROLE OF UV LIGHT IN INHIBITION OF ELECTROLESS DEPOSITION [J].

CHOW, SL ;

SCHLESIN.M ;

REZEK, J ;

HEDGECOC.NE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (08) :1013-&

[4] MOSSBAUER STUDY OF TIN(II) SENSITIZER DEPOSITS ON KAPTON [J].

COHEN, RL ;

DAMICO, JF ;

WEST, KW .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (12) :2042-&

[5] SOLUTION CHEMISTRY AND COLLOID FORMATION IN TIN CHLORIDE SENSITIZING PROCESS [J].

COHEN, RL ;

WEST, KW .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (04) :433-&

[6] SENSITIZER AGING EFFECTS ON METALIZATION AND IMAGING IN PHOTOSELECTIVE METAL DEPOSITION (PSMD) PROCESS [J].

DAMICO, JF ;

DEANGELO, MA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (11) :1469-1475

[7] OPTICAL RESPONSE IN PHOTOSELECTIVE METAL DEPOSITION (PSMD) IMAGING SYSTEM [J].

DAMICO, JF ;

LITT, FA ;

DEANGELO, MA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (07) :956-&

[8] SELECTIVE ELECTROLESS METAL DEPOSITION USING PATTERNED PHOTO-OXIDATION OF SN(II) SENSITIZED SUBSTRATES [J].

DAMICO, JF ;

DEANGELO, MA ;

HENRICKSON, JF ;

KENNEY, JT ;

SHARP, DJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (10) :1695-+

[9]

DROTAR JS, 1971, Patent No. 3573973

[10] SOME ASPECTS OF CHEMISTRY OF TIN SENSITIZING SOLUTIONS [J].

FELDSTEIN, N ;

SCHNABLE, GL ;

WEINER, JA .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (11) :1486-+

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