CAPILLARY INSTABILITIES IN THIN, CONTINUOUS FILMS

被引：185

作者：

JIRAN, E ^{[1
]}

THOMPSON, CV ^{[1
]}

机构：

[1] MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139

来源：

THIN SOLID FILMS | 1992年 / 208卷 / 01期

关键词：

D O I：

10.1016/0040-6090(92)90941-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The agglomeration of continuous films was studied in 60 nm thick, polycrystalline, gold films deposited on polished fused silica substrates. Nucleation of holes in any particular sample showed nucleation frequencies characteristic of site saturation. The growth of the holes resulted in roughly circular agglomerated areas. The area fraction transformed was measured as a function of time for several temperatures in oxygen and argon. Using a Johnson-Mehl-Avrami analysis and assuming a constant hole growth rate, the time dependence of the agglomeration can be described. The growth rates, which contain important kinetic information, could thus be determined. Growth rates for anneals in argon and oxygen were found to be similar.

引用

页码：23 / 28

页数：6

共 5 条

[1]

CHRISTIAN JW, 1975, THEORY TRANSFORMATIO, P18

[2] CAPILLARY INSTABILITIES IN THIN-FILMS [J].