ESTIMATION OF STRUCTURAL DAMAGE INDUCED BY CHEMICAL OR IONIC PROCESSES ON THE SURFACE OF CRYSTALLINE BINARY COMPOUNDS BY X-RAY PHOTOELECTRON DIFFRACTION - APPLICATION TO CHEMICALLY ETCHED GAAS (001) SURFACE
D O I:
10.1088/0268-1242/4/2/001
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];