REDUCTION OF PHOTORESIST STRIPPING RATES IN AN OXYGEN PLASMA BY BY-PRODUCT INHIBITION AND THERMAL MASS

被引：18

作者：

BATTEY, JF ^{[1
]}

机构：

[1] INT PLASMA CORP,HAYWARD,CA 94544

来源：

关键词：

D O I：

10.1149/1.2133230

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：147 / 152

页数：6

相关论文

共 8 条

[1] ABE H, 1974, 6TH P C SOL STAT DEV
[2] DISSOCIATION OF OXYGEN IN A RADIOFREQUENCY ELECTRICAL DISCHARGE
BELL, AT
KWONG, K
[J]. AICHE JOURNAL, 1972, 18 (05) : 990 - &
[3] BERSIN RL, 1970, SOLID STATE TECHNOL, V13, P39
[4] BLAUSTEIN BD, 1969, CHEM REACTIONS ELECT, P259
[5] HOLLAHAN JR, 1974, TECHNIQUES APPLICATI
[6] Irvin S.M., 1968, P KODAK PHOTORESIST, V2, P26
[7] MANES M, 1969, CHEM REACTIONS ELECT, P133
[8] PETERSON EE, 1965, CHEMICAL REACTION AN