BIAS-DEPENDENT ETCHING OF SILICON IN AQUEOUS KOH

被引:133
作者
GLEMBOCKI, OJ [1 ]
STAHLBUSH, RE [1 ]
TOMKIEWICZ, M [1 ]
机构
[1] CUNY BROOKLYN COLL,DEPT PHYS,BROOKLYN,NY 11210
关键词
D O I
10.1149/1.2113750
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
29
引用
收藏
页码:145 / 151
页数:7
相关论文
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