X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES ON THE OXIDATION BEHAVIOR OF CONI THIN-FILMS

被引：18

作者：

MAJUMDAR, D

SPAHN, RG

GAU, JS

机构：

[1] EASTMAN KODAK CO,RES LABS,MFG TECHNOL,ROCHESTER,NY 14650

[2] EASTMAN KODAK CO,RES LABS,DIVERSIFIED TECHNOL GRP,ROCHESTER,NY 14650

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 07期

关键词：

FILMS; -; Oxidation; SPECTROSCOPY; ELECTRON;

D O I：

10.1149/1.2100765

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The oxidation behavior of CoNi films of varying composition was studied using x-ray photoelectron spectroscopy (XPS). At 500 degree C and under 1 equals 10** minus **5 torr of oxygen, preferential oxidation of cobalt over nickel was observed in the alloys, although pure cobalt and pure nickel showed similar oxidation kinetics. The cobalt oxide, identified as CoO, grew parabolically at a rate dependent on the alloy composition. Oxidation-induced segregation of cobalt at the surface was also observed in the alloys.

引用

页码：1825 / 1829

页数：5

共 16 条

[1] INFLUENCE OF POLARIZATION OF BONDS ON ESCA SPECTRA OF COBALT OXIDES [J].