LOW-TEMPERATURE DEPOSITION OF Y-BA-CU-O SUPERCONDUCTING FILMS BY THERMAL CHEMICAL VAPOR-DEPOSITION

被引：23

作者：

YAMANE, H ^{[1
]}

HASEI, M ^{[1
]}

KUROSAWA, H ^{[1
]}

HIRAI, T ^{[1
]}

机构：

[1] RIKEN CO, KUMAGAYA 360, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1991年 / 30卷 / 6A期

关键词：

CHEMICAL VAPOR DEPOSITION; Y-BA-CU-O SUPERCONDUCTING FILM; LOW-TEMPERATURE GROWTH; BETA-DIKETONE METAL CHELATES; O-2; SUPERCONDUCTING TRANSITION TEMPERATURE; FILM SURFACE STRUCTURE;

D O I：

10.1143/JJAP.30.L1003

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Y-Ba-Cu-O superconducting films having a zero-resistance temperature of 84-85 K were prepared at 650-degrees-C on SrTiO3(100) single-crystal substrates without postannealing by thermal chemical vapor deposition using beta-diketone metal chelates as sources and O2 with low partial pressure as a reactant gas. The films mainly consisted of YBa2Cu3O(x) with a-axis and c-axis orientations normal to the film planes.

引用

页码：L1003 / L1005

页数：3

共 9 条

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