SPUTTER DEPOSITION OF THIN TANTALUM LAYERS AND LOW-TEMPERATURE INTERACTIONS BETWEEN TANTALUM AND SIO2 AND TANTALUM AND SILICON

被引：13

作者：

GALLAIS, P ^{[1
]}

HANTZPERGUE, JJ ^{[1
]}

REMY, JC ^{[1
]}

ROPTIN, D ^{[1
]}

机构：

[1] ECOLE NATL SUPER MECAN,PHYS MET LAB,F-44072 NANTES,FRANCE

来源：

THIN SOLID FILMS | 1988年 / 165卷 / 01期

关键词：

D O I：

10.1016/0040-6090(88)90693-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：227 / 236

页数：10

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