SHAPE-SELECTIVITY OVER HZSM-5 MODIFIED BY CHEMICAL VAPOR-DEPOSITION OF SILICON ALKOXIDE

被引:172
作者
HIBINO, T
NIWA, M
MURAKAMI, Y
机构
[1] Department of Synthetic Chemistry, School of Engineering, Nagoya University, Chikusa-ku, Nagoya, 464, Furo-cho
关键词
D O I
10.1016/0021-9517(91)90312-R
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Alkylation of toluene with methanol and toluene disproportionation have been carried out over HZSM-5 zeolites modified by chemical vapor deposition of silicon alkoxide. As the silica amount increased, the selectivity to m- and o-xylenes decreased, whereas that to p-xylene increased. The fraction of the para isomer in xylenes increased to more than 98%. From adsorption measurements and test reactions, it was found that this modification resulted in the narrowing of the pore-opening size and the inactivation of the external surface. The high para-selectivity was caused primarily by the narrowing of the pore-opening size. © 1991.
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页码:551 / 558
页数:8
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