SEQUENTIAL ISS-AES MEASUREMENT WITH SCANNING AUGER MICROPROBE

被引:15
作者
SHIMIZU, R
KUROKAWA, A
机构
关键词
D O I
10.1016/0039-6028(86)90063-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
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页码:653 / 656
页数:4
相关论文
共 14 条
[1]  
BETZ G, 1983, SPUTTERING PARTICLE, V2, pCH2
[2]  
BISHOP HE, 1982, ELECTRON BEAM INTERA, P219
[3]  
ICHIMURA S, 1981, SCANNING ELECTRON MI, V1, P231
[4]  
KANG HJ, 1984, SURF SCI, V144, P541, DOI 10.1016/0039-6028(84)90116-X
[5]  
KANG HJ, 1982, SURF SCI, V116, pL173, DOI 10.1016/0039-6028(82)90672-0
[6]   ON THE ROLE OF GIBBSIAN SEGREGATION IN CAUSING PREFERENTIAL SPUTTERING [J].
KELLY, R .
SURFACE AND INTERFACE ANALYSIS, 1985, 7 (01) :1-7
[8]  
KUROKAWA A, 1986, 33TH P SPRING M JAP
[9]   BEAM BRIGHTNESS MODULATION (BBM) METHOD AS APPLIED TO AUGER-ELECTRON SPECTROSCOPY [J].
MOGAMI, A .
SURFACE AND INTERFACE ANALYSIS, 1985, 7 (05) :241-251
[10]  
NIEHUS H, 1975, REV SCI INSTRUM, V46, P1275, DOI 10.1063/1.1134417