X-RAY-DIFFRACTION TECHNIQUES FOR ANALYSIS OF EPITAXIC THIN-FILMS

被引：21

作者：

WALLACE, CA

WARD, RCC

机构：

[1] MARCONI ELLIOTT AVIONIC SYST LTD,BOREHAMWOOD,ENGLAND

[2] GEC,HIRST RES CTR,WEMBLEY,ENGLAND

来源：

JOURNAL OF APPLIED CRYSTALLOGRAPHY | 1975年 / 8卷 / OCT1期

关键词：

D O I：

10.1107/S0021889875011235

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：545 / 556

页数：12

共 8 条

[1] GROWTH, CRYSTALLOGRAPHIC AND ELECTRICAL ASSESSMENT OF EPITAXIAL LAYERS OF ALUMINUM NITRIDE ON CORUNDUM SUBSTRATES [J].

CALLAGHAN, MP ;

PATTERSON, E ;

RICHARDS, BP ;

WALLACE, CA .

JOURNAL OF CRYSTAL GROWTH, 1974, 22 (02) :85-98

[2] GEOMETRY OF X-RAY MULTIPLE DIFFRACTION IN CRYSTALS [J].

ISHERWOOD, BJ ;

WALLACE, CA .

ACTA CRYSTALLOGRAPHICA SECTION A-CRYSTAL PHYSICS DIFFRACTION THEORETICAL AND GENERAL CRYSTALLOGRAPHY, 1971, A 27 (MAR1) :119-+

[3]

ISHERWOOD BJ, 1971, 1971 INT C CRYST GRO

[4] CRYSTALLOGRAPHIC ASPECTS OF THIN PTSI FILMS ON SI SUBSTRATES [J].

RICHARDS, BP ;

SCOBEY, IH ;

WALLACE, CA .

JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1974, 7 (APR1) :275-280

[5]

RICHARDS BP, 1973, 1973 BACG C

[6] TOPOTACTIC REACTION BETWEEN NICKEL AND GALLIUM-ARSENIDE [J].

SCOBEY, IH ;

WALLACE, CA ;

WARD, RCC .

JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1973, 6 (DEC1) :425-437

[7] X-RAY TEST OF POLARITY OF SILICON CARBIDE CRYSTALS [J].

WALLACE, CA .

JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1970, 3 (OCT1) :328-&

[8] X-RAY CYLINDRICAL TEXTURE CAMERA FOR EXAMINATION OF THIN-FILMS [J].

WALLACE, CA ;

WARD, RCC .

JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1975, 8 (APR1) :255-260

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