PLASMA CVD DIAMOND DEPOSITION IN C-H-O SYSTEMS

被引：40

作者：

INSPEKTOR, A ^{[1
]}

LIOU, Y ^{[1
]}

MCKENNA, T ^{[1
]}

MESSIER, R ^{[1
]}

机构：

[1] PENN STATE UNIV,MAT RES LAB,UNIVERSITY PK,PA 16802

来源：

SURFACE & COATINGS TECHNOLOGY | 1989年 / 39卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(89)90055-8

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：211 / 221

页数：11

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