MAGNETIZATION PROCESS AND COERCIVITY OF SPUTTERED CO/PT MULTILAYERED FILMS

被引：19

作者：

HONDA, S

TANIMOTO, H

KUSUDA, T

机构：

[1] Department of Physical Electronics, Faculty of Engineering, Hiroshima University

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1990年 / 26卷 / 05期

关键词：

D O I：

10.1109/20.104853

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The film structures and the magnetic properties of Co/Pt multilayers prepared by magnetron sputtering are examined. The multilayer consists of columns of 50~100A diameter grown up vertically to the film plane, and the coercive field becomes smaller with decreasing thickness ratio of Co to Pt layers and also total film thickness. The coercivity, however, can be enlarged up to about 3 koe by a Pt underlayer even in ultrathin Co/Pt films. The magnetization process, the angular dependence of coercivity and the behavior of the magnetic domains are explained by the mixing mode of the wall motion and the moment rotation. © 1990 IEEE

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页码：2730 / 2732

页数：3

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