THE MULTIPLY CHARGED ION PRODUCTION IN ECR ION SOURCES

被引:8
作者
SHIRKOV, G
机构
[1] Joint Institute for Nuclear Research, Moscow 101000
关键词
D O I
10.1063/1.1142790
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The ion confinement and loss conditions in the open magnetic traps have been analyzed in this article. In ECRIS the ions are confined in the negative potential well. The ions with higher charge states have the longer lifetimes and the less probability of output in the negative potential well. The mean ion charged state in the trap is higher than in the output ion beam. The general methods for increasing the multiply charged ion extraction from the ECRIS are determined. The usage of ion cooling mode for the increasing ion charge states in the plasma is substantiated. The large output pulse of multiply charged ions in the rf pulse mode is explained. The numerical simulation of the ion cooling and rf pulse processes for Minimafios-type ECRIS have been carried out. Some other ways are proposed in the present paper to obtain the pulse beams of multiply charged ions in ECRIS.
引用
收藏
页码:2894 / 2896
页数:3
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