SAM/AES ANALYSIS OF GRAIN-BOUNDARIES IN ZIRCONIA CERAMICS

被引:4
作者
MOSER, EM
METZGER, M
GAUCKLER, LJ
机构
[1] PHYS ELECTR GMBH,D-85737 ISMANING,GERMANY
[2] ETH ZENTRUM,CH-8092 ZURICH,SWITZERLAND
来源
FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY | 1995年 / 353卷 / 5-8期
关键词
D O I
10.1007/BF00321350
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Grain boundary impurity silicate phases and the segregation process of cations to grain boundaries in zirconia ceramics have been investigated using SAM/AES. Point analyses at triple points and grain surfaces revealed a glassy silicate phase between the grain. The analysis of KLL and LMM Auger transitions for alumina and silica indicate that the grain boundary phase consists of about two monolayers of silica covering the alumina enriched silicate phase. In titania-stabilised zirconia ceramic, titanium cations are found to be enriched by a factor of 3.8 in the near-grain-boundary region.
引用
收藏
页码:684 / 689
页数:6
相关论文
共 15 条
[1]   SURFACE COMPOSITIONAL CHANGES OF ZRO2 IN H2O, H-2 AND ATOMIC-HYDROGEN, INVESTIGATED BY AES AND EELS [J].
AXELSSON, KO ;
KECK, KE ;
KASEMO, B .
APPLIED SURFACE SCIENCE, 1986, 25 (1-2) :217-230
[2]  
Badwal S. P. S., 1992, Journal of the European Ceramic Society, V10, P115, DOI 10.1016/0955-2219(92)90126-X
[3]  
DAVIS LE, 1978, HDB AUGER ELECTRON S
[4]   SAM ANALYSIS OF FRACTURE SURFACES OF CERAMICS [J].
HAMMINGER, R .
SURFACE AND INTERFACE ANALYSIS, 1988, 12 (1-12) :519-526
[6]  
HUGHES AE, 1991, MAT FORUM, V13, P303
[7]   GRAIN-SIZE CONTROL OF TETRAGONAL ZIRCONIA POLYCRYSTALS USING THE SPACE-CHARGE CONCEPT [J].
HWANG, SL ;
CHEN, IW .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1990, 73 (11) :3269-3277
[8]   X-RAY PHOTOELECTRON SPECTROSCOPIC INVESTIGATION OF IMPURITY PHASE SEGREGATION IN CERIA YTTRIA ZIRCONIA [J].
INGO, GM ;
MATTOGNO, G ;
ZACCHETTI, N ;
SCARDI, P ;
DALMASCHIO, R .
JOURNAL OF MATERIALS SCIENCE LETTERS, 1991, 10 (06) :320-322
[9]   X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES ON YTTRIA-STABILIZED ZIRCONIA AND ITS SURFACE TRANSFORMATIONS [J].
MAJUMDAR, D ;
CHATTERJEE, D .
THIN SOLID FILMS, 1991, 206 (1-2) :349-354
[10]   SPUTTER REDUCTION OF OXIDES BY ION-BOMBARDMENT DURING AUGER DEPTH PROFILE ANALYSIS [J].
MITCHELL, DF ;
SPROULE, GI ;
GRAHAM, MJ .
SURFACE AND INTERFACE ANALYSIS, 1990, 15 (08) :487-497