INSITU DEFORMATION MEASUREMENT ON THE SURFACE OF SILICON-WAFERS

[1] GUIDICI DC, 1979, SPIE DEV SEMICOND MI, V174, P132

[2] MECHANICAL-STRESS AT (111) SI SURFACE COVERED BY SIO2 AND AL-SIO2 LAYERS [J]. SURFACE SCIENCE, 1978, 73 (01) : 357 - 364

[3] KOCH R, 1980, 8TH P INT VAC C, V1, P342

[4] SYNBORSKI CE, 1973, SPIE DEV SEMICOND MI, V174, P143

[5] Takasaki H., 1970, APPL OPTICS, V9, P1457

[6] WILCOCK JD, 1967, THESIS LONDON U LOND

[1] GUIDICI DC, 1979, SPIE DEV SEMICOND MI, V174, P132

[2] MECHANICAL-STRESS AT (111) SI SURFACE COVERED BY SIO2 AND AL-SIO2 LAYERS [J]. SURFACE SCIENCE, 1978, 73 (01) : 357 - 364

[3] KOCH R, 1980, 8TH P INT VAC C, V1, P342

[4] SYNBORSKI CE, 1973, SPIE DEV SEMICOND MI, V174, P143

[5] Takasaki H., 1970, APPL OPTICS, V9, P1457

[6] WILCOCK JD, 1967, THESIS LONDON U LOND