DEPOSITION OF DIAMOND-LIKE CARBON-FILMS BY THE ANODIC ARC TECHNIQUE

The anodic vacuum are is a powerful means of high rate deposition of thin films, besides a high degree of ionization, one of its interesting aspects is a strongly reduced droplet formation. Using graphite electrodes and adding hydrogen into the deposition chamber the preparation of diamond-like carbon films is possible, permitting an independent variation in the essential parameters. The films obtained show atomic number densities as a function of hydrogen content which are typical for diamond-like films prepared by conventional methods; the hydrogen content is determined by secondary-ion mass spectroscopy depth profiles. The dependence of the hydrogen content of the films on the gas flow is well characterized and saturation can be observed. This effect allows the deposition of homogeneous films even if the deposition rate changes locally or as a function of time. A comparison of IR spectra, hardness and mechanical stresses with data from films obtained by r.f. plasma chemical vapour deposition allows further characterization of these films.