FABRICATION OF LOW RESISTIVE CDS THIN-FILMS

被引：9

作者：

DAWAR, AL

SHISHODIA, PK

CHAUHAN, G

KUMAR, A

MATHUR, PC

机构：

[1] ARSD COLL,DEPT PHYS,NEW DELHI 110021,INDIA

[2] UNIV DELHI,DEPT PHYS & ASTROPHYS,DELHI 110007,INDIA

来源：

THIN SOLID FILMS | 1991年 / 201卷 / 01期

关键词：

D O I：

10.1016/0040-6090(91)90147-P

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Low resistive and high mobility thin films of CdS have been grown using vacuum evaporation techniques. X-ray diffraction studies show that the films are well oriented with a preferential growth of crystallites in the (002) plane. The value of conductivity observed in these films is in the range 0.088-OMEGA-1 cm-1-1.34-OMEGA-1 cm-1 at 300 K.

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收藏

页码：L1 / L5

页数：5

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